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Immersion lithography
Results: 40

#	Item
31	Charting CEBL’s Role in Mainstream Semiconductor Lithography David K. Lam Multibeam Corporation, 4008 Burton Drive, Santa Clara, CA, USA 95054* ABSTRACT E-Beam direct writing (EBDW) requires no masks and affords high r Add to Reading List Source URL: www.multibeamcorp.com Language: English - Date: 2014-06-26 13:06:22 Maskless lithography Photolithography Electron beam lithography Multiple patterning Resist Wafer Lithography Immersion lithography Photomask Technology Semiconductor device fabrication Microtechnology
32	Microsoft PowerPoint - Semicon TWINSCAN NXT1970Ci final (handout version).pptx Add to Reading List Source URL: www.semicontaiwan.org Language: English - Date: 2013-09-12 01:42:40 Wafer Extreme ultraviolet lithography Semiconductor device fabrication Immersion lithography Multiple patterning
33	Microsoft Word - SPIE 2005 Simulation History paper.doc Add to Reading List Source URL: www.lithoguru.com Language: English - Date: 2012-04-29 13:07:52 Microtechnology Photolithography Immersion lithography PROLITH Lithography Silvaco Optical proximity correction Simulation Resist Materials science Technology Semiconductor device fabrication
34 $Technology / Extreme ultraviolet lithography / Photomask / Microtechnology / Phase-shift mask / Immersion lithography / Diffraction / Camera lens / Reticle / Materials science / Optics / Physics$	Photomask BACUS—The international technical group of SPIE dedicated to the advancement of photomask technology. Add to Reading List Source URL: spie.org Language: English - Date: 2014-01-16 09:38:11 Technology Extreme ultraviolet lithography Photomask Microtechnology Phase-shift mask Immersion lithography Diffraction Camera lens Reticle Materials science Optics Physics
35	Copyright 2007 Society of Photo-Optical Instrumentation Engineers. This paper was published in SPIE Vol[removed]p[removed], and is made Add to Reading List Source URL: www.lithoguru.com Language: English - Date: 2012-04-29 13:06:09 Stepper Photolithography Photomask Semiconductor device fabrication Solid immersion lens Lens Camera lens Nikon Lithography Materials science Technology Optics
36	2006 Lithography Update Michael Lercel And the rest of the Litho TWG’s Add to Reading List Source URL: www.itrs.net Language: English - Date: 2006-12-05 09:53:48 32 nanometer 45 nanometer Ultraviolet Resist Extreme ultraviolet lithography Microtechnology Materials science Multiple patterning Immersion lithography
37	2006 Lithography Update Michael Lercel And the rest of the Litho TWG’s Add to Reading List Source URL: www.itrs.net Language: English - Date: 2006-12-05 09:53:48 32 nanometer 45 nanometer Ultraviolet Resist Extreme ultraviolet lithography Microtechnology Materials science Multiple patterning Immersion lithography
38	PDF Document Add to Reading List Source URL: www.ieee.org Language: English IEEE Cledo Brunetti Award Microfabrication Supriyo Datta Institute of Electrical and Electronics Engineers Lithography Jack Kilby Integrated circuit Immersion lithography Intel Technology Engineering Science
39	PDF Document Add to Reading List Source URL: www.itrs.net Language: English - Date: 2009-12-31 00:00:39 Semiconductor device fabrication Extreme ultraviolet lithography Multiple patterning Photolithography Photomask Immersion lithography Overlay Control Optical proximity correction Mask shop Microtechnology Materials science Nanotechnology
40	PDF Document Add to Reading List Source URL: download.intel.com Language: English - Date: 2009-02-09 18:28:58 32 nanometer Electronic engineering Electronics Immersion lithography Technology Cell microprocessor implementations 45 nanometer Intel 65 nanometer

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